What’s new in Gen-2.5:
- Controllable Thinking Effort lets you choose between speed and detail across five generation modes.
- Extreme High can deliver skin-texture-level detail with detailed inputs, reaching up to tens of millions of polygons.
- Extreme Low can generate up to 1M-polygon or lower-poly models in around 4 seconds, making it ideal for fast iteration and API workflows.
- A new 3D-native texturing architecture brings full PBR materials, fewer blind spots, and more realistic surface results.
- All modes support batch generation, and Low + X10 is a great setup for exploring 10 outputs at once.
- Smart Low-poly now supports more artist-style topology for workflows that need cleaner, more usable meshes.
Plus, all your favorite features are enhanced:
- Recursive Part Generation & Refnement for complex assemblies
- Bake High-Poly Mesh → Low-Poly + Normal Maps for efficient workflows
- HD Texture for richer surface details
- 3D-To-3D Edit: Partial Redo & Local Modify
- Third-party Model Import & Edit
- 3D ControlNets
- Quads at Part-Level
- T/A Pose Support
- Full PBR Material Pipeline
- Multi-view Input
- Image Remix
- Different Modes